NTT-AT and EVG Demonstrate SmartNIL® for AR Optical Devices
NTT ADVANCED TECHNOLOGY CORPORATION (NTT-AT), headquartered in Shinjuku-ku, Tokyo, and EV Group (EVG), headquartered in Austria, have jointly verified the compatibility of NTT-AT’s UV-curable, high-refractive-index resins with EVG’s proprietary SmartNIL® process technology. The evaluation also confirmed the feasibility of manufacturing waveguides for augmented reality (AR) optical devices using this material-and-process combination.
The joint study demonstrated high pattern fidelity, repeatable imprinting performance, and environmental resistance—key requirements for the production of advanced optical components. The results highlight the potential of combining NTT-AT’s NH700 Series high-refractive-index resins with EVG’s SmartNIL® technology to support the manufacture of AR optical devices.
The findings will be presented at the 27th China International Optoelectronic Exposition (CIOE 2026). A white paper summarizing the evaluation results will also be published.
1. Background
The growing demand for next-generation wearable displays, including AR glasses, is driving the development of optical technologies that combine lightweight designs with high image quality. AR waveguides are essential to these systems because they guide and direct light through micro-optical structures, such as diffraction gratings and meta-optical elements.
Manufacturing these structures requires technologies capable of producing extremely small features with high precision, consistency, and cost efficiency. Nanoimprint lithography (NIL) has emerged as a promising approach because it can replicate nanoscale patterns accurately while offering potential advantages for scalable production.
However, the successful commercialization of NIL-based AR optical devices depends not only on the performance of the imprinting equipment but also on the compatibility and reliability of the materials used. High-refractive-index resins are particularly important because they can help improve optical performance while enabling the fabrication of compact waveguide structures.
To address these requirements, NTT-AT and EVG conducted a joint evaluation of NTT-AT’s NH700 Series resins using EVG’s SmartNIL® process technology.
2. Evaluation Overview and Results
As part of the evaluation, NTT-AT used NH762, one of the high-refractive-index resins in its NH700 Series, to verify compatibility with EVG’s SmartNIL® technology and EVG® NIL UV/AS5 working stamp material.
The evaluation focused on pattern replication accuracy, imprinting repeatability, and environmental resistance. The results confirmed that NH762 can support the high-precision patterning requirements of AR waveguides and demonstrated its potential for practical manufacturing applications.
High-precision replication was successfully achieved for 350 nm line-and-space structures. The evaluation also demonstrated successful replication of 45° slanted gratings and meta-optical elements with minimum feature sizes of 65 nm. These structures were reproduced without defects or deformation, confirming the resin’s ability to support the fabrication of complex nanoscale optical patterns.
Repeatability was assessed through a consecutive 25-imprint test using EVG® NIL UV/AS5. The change in imprinted pattern height was limited to approximately 2.2%, demonstrating dimensional stability and consistent release performance. These characteristics are important for production environments, where maintaining pattern uniformity over repeated imprint cycles is essential.
Environmental resistance was also evaluated using samples imprinted with NH762. The samples underwent damp-heat and light-exposure testing, after which changes in the imprinted pattern structures remained extremely small. This result confirms the material’s ability to maintain pattern integrity under environmental conditions relevant to AR optical device applications.
Together, the results demonstrate that NH762 offers strong practical potential as an AR waveguide material, combining a high refractive index, high transparency, and environmental durability.
NH700 Series High-Refractive-Index Resins
| Specification | NH700 Series |
|---|---|
| Refractive index of cured film | 1.8, 1.9 |
| Cured film thickness | 200 nm–1 μm (typically 300 nm) |
3. Customer Benefits
The development of AR optical devices typically involves extensive material evaluation, reliability testing, and process verification. These activities can require significant time and resources, particularly when manufacturers must assess material performance and imprinting compatibility separately.
Through this joint evaluation, NTT-AT and EVG have established a material-and-process combination whose compatibility has been assessed in advance. This provides customers with a more reliable starting point for evaluating NIL-based AR optical device manufacturing.
The results are expected to help AR optical device manufacturers shorten the time required for material selection and early-stage process development. By reducing the need for initial compatibility testing, the evaluated solution may also support a smoother transition toward production-scale manufacturing.
The combination of NTT-AT’s high-refractive-index resins and EVG’s SmartNIL® technology offers a promising foundation for manufacturers seeking to develop precise, durable, and scalable optical components.
4. White Paper Availability
A white paper summarizing the results of the joint evaluation will be available on the NTT-AT website.
White paper and product information: NTT-AT High-Refractive-Index Resins
5. Future Development
In addition to NH762, the material evaluated in this study, NTT-AT and EVG plan to evaluate the imprinting performance of other materials in the NH700 Series using the same nanoimprint equipment.
The companies will continue their development and evaluation activities with a view to expanding the application of these materials and processes beyond AR optical devices. Potential future applications include next-generation meta-optical elements, LiDAR, and sensing devices.
By combining advanced materials with high-precision nanoimprint technology, NTT-AT and EVG aim to support the development of innovative optical and photonic components for emerging markets.
6. Exhibition Information
Exhibition: The 27th China International Optoelectronic Exposition (CIOE 2026)
Dates: September 9–11, 2026
Venue: Shenzhen World Exhibition & Convention Center
Event information: CIOE 2026
About NTT ADVANCED TECHNOLOGY CORPORATION
Established in 1976, NTT ADVANCED TECHNOLOGY CORPORATION (NTT-AT) is a technology-driven company within the NTT Group. The company leverages advanced technologies developed by NTT laboratories, together with leading-edge technologies from around the world, to address a wide range of technical and business challenges.
NTT-AT integrates these technologies to deliver value to customers through four core business domains: Applications, Materials & Nanotechnology, Social Platforms, and Total Solutions.
Website: NTT-AT Corporate Website
About EV Group
EV Group (EVG) provides innovative process solutions and expertise for leading-edge and future semiconductor designs and chip integration schemes. The company’s vision of exploring new techniques and supporting next-generation applications of micro- and nanofabrication technologies enables customers to commercialize new product ideas.
EVG’s high-volume-manufacturing-ready products include wafer bonding, lithography, thin-wafer processing, and metrology equipment. These technologies support advances in semiconductor front-end scaling, 3D integration, advanced packaging, and other electronics and photonics applications.
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